An experiment on the dynamics of ion implantation and sputtering of surfaces G. M. Wright, H. A. Barnard, L. A. Kesler, E. E. Peterson, P. W. Stahle, R. M. Sullivan, D. G. Whyte, and K. B. Woller Citation: Review of Scientific Instruments 85, 023503 (2014); doi: 10.1063/1.4861917 View online: http://dx.doi.org/10.1063/1.4861917 View Table of Contents: http://scitation.aip.org/content/aip/journal/rsi/85/2?ver=pdfcov Published by the AIP Publishing Articles you may be interested in Advanced secondary ion mass spectroscopy quantification in the first few nanometer of B, P, and As ultrashallow implants J. Vac. Sci. Technol. B 28, C1C48 (2010); 10.1116/1.3225588 Characteristics of altered layers formed by sputtering with a massive molecular ion containing diverse elements with large mass differences J. Appl. Phys. 102, 073509 (2007); 10.1063/1.2786906 Molybdenum angular sputtering distribution under low energy xenon ion bombardment J. Appl. Phys. 100, 063301 (2006); 10.1063/1.2336502 Polycrystallization and surface erosion of amorphous GaN during elevated temperature ion bombardment J. Appl. Phys. 88, 5493 (2000); 10.1063/1.1318361 Ion beam synthesis of cobalt disilicide using focused ion beam implantation J. Vac. Sci. Technol. B 16, 2574 (1998); 10.1116/1.590154

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REVIEW OF SCIENTIFIC INSTRUMENTS 85, 023503 (2014)

An experiment on the dynamics of ion implantation and sputtering of surfaces G. M. Wright, H. A. Barnard, L. A. Kesler, E. E. Peterson, P. W. Stahle, R. M. Sullivan, D. G. Whyte, and K. B. Woller Plasma Science and Fusion Center, MIT, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, USA

(Received 15 August 2013; accepted 28 December 2013; published online 10 February 2014) A major impediment towards a better understanding of the complex plasma-surface interaction is the limited diagnostic access to the material surface while it is undergoing plasma exposure. The Dynamics of ION Implantation and Sputtering Of Surfaces (DIONISOS) experiment overcomes this limitation by uniquely combining powerful, non-perturbing ion beam analysis techniques with a steadystate helicon plasma exposure chamber, allowing for real-time, depth-resolved in situ measurements of material compositions during plasma exposure. Design solutions are described that provide compatibility between the ion beam analysis requirements in the presence of a high-intensity helicon plasma. The three primary ion beam analysis techniques, Rutherford backscattering spectroscopy, elastic recoil detection, and nuclear reaction analysis, are successfully implemented on targets during plasma exposure in DIONISOS. These techniques measure parameters of interest for plasma-material interactions such as erosion/deposition rates of materials and the concentration of plasma fuel species in the material surface. © 2014 AIP Publishing LLC. [http://dx.doi.org/10.1063/1.4861917] I. INTRODUCTION

One of the highest priority research areas toward advancing nuclear fusion energy is understanding how the intense plasmas from a magnetically confined tokamak interact with the solid plasma-facing components (PFC) in the first wall. The plasma-material interface is a complex and highly interdependent system, with both being highly perturbing to the other. There are also other environments where the plasma-material interface is highly coupled such as in plasma thrusters, semi-conductor processing, and thin-film deposition. With such a complex, constantly evolving system, it is critical to understand the dynamics of the plasma-surface interactions. Presently there are many diagnostics to monitor and measure the evolving plasma.1, 2 However, diagnostic access to the PFC surface in plasma environments is very limited. The examination of the material surface is usually performed via a comparison of pre- and post-exposure measurements, sometimes spanning months of exposures of varying conditions in fusion devices,3 thereby missing entirely the dynamics of any modifications of effects and making it difficult to perform controlled studies and/or compare results to time-dependent modeling or simulation. The Dynamics of ION Implantation and Sputtering Of Surfaces (DIONISOS) experiment was designed specifically to investigate the dynamic effects of a surface under plasma bombardment. This is an experiment that combines wellcontrolled plasma and target conditions while simultaneously probing the near-surface region via high-energy ∼MeV ion beam analysis (IBA) to monitor the target material for dynamic changes during plasma exposure. Other devices have previously coupled dynamic ion beam analysis with magnetron plasma sources,4, 5 low-power RF plasma sources,6 and low-energy ion beams,7 however DIONISOS is unique in coupling dynamic ion beam analysis with a helicon plasma

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source. The advantage of a helicon plasma source is that it provides higher plasma fluxes than a low-power RF or DC glow discharge plasma while still producing a thermalized (Te = 4–8 eV) and magnetized plasma. This allows access to lower incident ion energies on targets and recreate much of the physics found in fusion plasma boundary and plasma thruster plasma-material interactions (e.g., plasma transport, re-ionization, re-deposition, etc.). The high-energy ions from the tandem ion accelerator can also be intentionally used to induce displacement damage in the target material as a proxy for the neutron-induced damage expected in an operating fusion reactor. Thus, it can also examine potential synergistic effects between ion/neutron damage from high-energy particles and material modification via low-energy (

An experiment on the dynamics of ion implantation and sputtering of surfaces.

A major impediment towards a better understanding of the complex plasma-surface interaction is the limited diagnostic access to the material surface w...
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